Special film-forming technology "Osmium Coating"
Very smooth surface! Uniform special film-forming technology even on the inner walls.
By depositing osmium onto a high-precision processed and purified aperture plate, it is possible to prevent charge-up of the aperture plate. Osmium is a thin film with high hardness, high melting point, and good conductivity. Using the plasma CVD method for deposition allows for the formation of a uniform and smooth film even inside fine holes. 【Features】 ○ Film thickness: 50nm ○ Good conductivity ○ Excellent heat resistance For more details, please contact us or download the catalog.
- 企業：大和テクノシステムズ 本社
- 価格：Other
